KTa_(0.5)Nb_(0.5)O_3 ferroelectric thin films grown by pulsed laser deposition: structural characteristics and applications to microwave devices

摘要

In this paper, we report on KTN ferroelectric thin films grown by Pulsed Laser Deposition on various substrates suitable for microwave applications and the agility of CPW stub resonators operating in X-band printed on these films. The ferroelectric material selected here is KTa_(0.5)Nb_(0.5)O_3 (KTN). X-ray characterizations and scanning electron microscopy re-rnvealed an epitaxial growth on MgO and LaAlO_3 substrates, while films deposited on sapphire were textured Measurements have demonstrated a tunability reaching 5% for KTN/sapphire and 1% for KTN/MgO-LaAlO_3. The resonators have also been characterized in terms of quality factor.