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Photoinduced fluorescence enhancement and energy transfer effects of quantum dots porous silicon

机译:量子点多孔硅的光致荧光增强和能量转移效应

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摘要

We investigate photoinduced fluorescence enhancement (PFE) and energy transfer effects of surfactant capped Cd/Se core and CdSe/ZnS core/shell quantum dots (QD) that emit at 630-650 nm adsorbed in and onto porous silicon (PSi) single layer films and microcavity devices. Evidence is presented for fluorescence resonance energy transfer (FRET) from the QD (emitter) to mesoPSi nanostructures (acceptor) that photoluminess between 650-850 nm. We also observe a strong PFE of QD emission adsorbed into meso porous silicon (mesoPSi) under continuous irradiation with 532 nm excitation light. New insight into the mechanism of PFE is gleaned from studies of PSi pore size and surface chemistry including native, H_2O_2, UV-ozone, and thermal oxides, andrnaminosilane coated thermal oxide mesoPSi. These treatments alter the photoluminescent characteristics of the mesoPSi and QD. The PFE effect on QD PL is largest on thermally oxidized microcavities. PFE is considerably weaker for CdSe QD adsorbed onto macroPSi, silicon wafer surfaces and especially for ZnS capped QD suggesting the PFE effect requires a close interaction of the QD core with oxidized substrate. It is plausible that mesoPSi (10-20 nm dia) mediates a more intimate contact compared to macro or planar Si wafer. The PFE effect dynamically increases the QD PL by passivating nonradiative state through oxidation and possibly through increasing the lifetime of nonradiative trapped state by coupling to surface vibrations.
机译:我们研究了光致荧光增强(PFE)和表面活性剂封盖的Cd / Se核和CdSe / ZnS核/壳量子点(QD)的能量传递效应,它们在630-650 nm处发射并吸附在多孔硅(PSi)单层膜中或表面上和微腔设备。提出了从QD(发射极)到光致发光度在650-850 nm之间的mesoPSi纳米结构(受体)的荧光共振能量转移(FRET)的证据。我们还观察到在连续532 nm激发光照射下,QD发射强PFE吸附到中孔多孔硅(mesoPSi)中。通过对PSi孔径和表面化学的研究,包括对天然,H_2O_2,UV-臭氧和热氧化物以及甲基氨基硅烷包覆的热氧化物mesoPSi的研究,可以获取有关PFE机理的新见解。这些处理改变了mesoPSi和QD的光致发光特性。 PQ对QD PL的影响在热氧化微腔上最大。对于吸附在macroPSi上的CdSe QD,硅晶片表面,特别是对于ZnS封盖的QD,PFE的强度要弱得多,这表明PFE效果需要QD核与氧化衬底的紧密相互作用。与宏观或平面Si晶圆相比,介观PSi(直径10-20 nm)介导更紧密的接触是合理的。 PFE效应通过氧化钝化非辐射态并可能通过耦合到表面振动来增加非辐射捕获态的寿命来动态提高QD PL。

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