机译:P型结晶硅晶片表面钝化用a-SiOx Ny:H / SiN x叠层的电子性质
Department of Materials Science and Engineering, Norwegian University of Science and Technology, Trondheim, Norway;
Department for Solar Energy, Institute for Energy Technology, Kjeller, Norway;
Department of Materials Science and Engineering, Norwegian University of Science and Technology, Trondheim, Norway;
Department for Solar Energy, Institute for Energy Technology, Kjeller, Norway;
Department for Solar Energy, Institute for Energy Technology, Kjeller, Norway;
Passivation; Silicon; Chemicals; Thermal stability; Semiconductor device measurement; Voltage measurement;
机译:有效表面复合速度小于1 cm / s的a-Si / SiO_2 / SiN_x叠层对n型c-Si晶片进行表面钝化
机译:等离子体沉积AlO $ _ {bm x} $ / SiN $ _ {bm x} $介电堆栈在重掺杂n型和p型硅表面钝化方面的进展
机译:用于晶体硅表面钝化的Al_2O_3和Al_2O_3 / a-SiN_x:H堆叠的稳定性
机译:太阳能级P型CZ Si晶片沉积的热AL_2O_3和SIN_X堆叠层的钝化性能研究
机译:Y-烯炔的合成,光环化,堆积,溶剂变色性质和液晶行为。
机译:对镜面硅晶圆背面区域的图像堆栈进行分类:CNN和SVM的性能比较
机译:对晶体硅太阳能电池的p型多Si / SiOx叠层的氢钝化作用
机译:硅表面的siN sub x钝化