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首页> 外文期刊>Photovoltaics, IEEE Journal of >The Critical Role of AlInP Window Design in III–V Rear-Emitter Solar Cells
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The Critical Role of AlInP Window Design in III–V Rear-Emitter Solar Cells

机译:AlinP窗口设计在III-V后发射极太阳能电池中的关键作用

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摘要

This article highlights the critical role of window design on short circuit carrier collection in rear-emitter solar cells, as demonstrated through modeling and experiment using metamorphic GaAsyP1-y. Ultimately, if the window design is not carefully considered, surface depletion caused by Fermi level pinning at the window/air interface can extend into regions of active collection resulting in a large increase in effective window/base interface recombination velocity. This was experimentally shown here to result in a potential AM1.5G photocurrent loss of 8.1 mA/cm(2), or nearly 50%, based on integrated internal quantum efficiency (IQE). Associated IQE modeling and curve fitting indicate that the effective IRV at the GaAs0.75P0.25/Al0.64In0.36P interface is increased by multiple orders of magnitude when the window is not sufficiently thick or doped to fully contain the surface depletion to within the window layer. Calculations of the surface depletion depth as a function of doping and the surface Fermi pinning energy level provides insight into the fundamental limits of window thickness. This allows the estimation of the Al0.64In0.36P surface pinning level to be at least 1.25 eV below the conduction band edge, or in the bottom half of the bandgap.
机译:本文突出了窗口设计在后发射器太阳能电池中的短路载体集合上的关键作用,如使用变质Gaasyp1-y的建模和实验所展示的。最终,如果没有仔细考虑窗口设计,在窗口/空气接口处由费米水平钉扎引起的表面耗尽可以延伸到有效窗口/基础接口复合速度的大幅增加。这在此实验显示,基于集成的内部量子效率(IQE)导致8.1mA / cm(2),或接近50%的潜在AM1.5g光电流损失。相关的IQE建模和曲线拟合表明,当窗口不充分厚或掺杂时,GAAS0.75P0.25 / AL0.64IN0.36P接口的有效IRV增加了多个数量级,以完全包含在内部的表面耗尽窗口层。作为掺杂功能的表面耗尽深度和表面FERMI钉扎能级的计算能够深入了解窗厚的基本限制。这允许估计Al0.64in0.36p表面钉液位为至少1.25eV在导通带边缘下方,或者在带隙的下半部分下方。

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