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Performance of Single-Crystal Silicon Solar Cells With Mist-Deposited Nanocrystalline Quantum Dot Downshifting Films

机译:薄雾沉积纳米晶量子点降档膜的单晶硅太阳能电池的性能

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The paper is concerned with an investigation of the effect of the mist-deposited downshifting nanocrystalline quantum dots (NQD) films both continuous and patterned on the performance of single-crystal commercial silicon solar cells. Different thicknesses of the NQD films are explored in an attempt to improve cell's efficiency in the ultraviolet (UV) range (below 400 nm) of the solar spectrum. The results obtained indicate that the maximum UV absorption is observed with a 50-nm-thick NQD film as reflected by on the average 45% increase in UV external quantum efficiency as compared with the solar cell without the NQD film. The patterned NQD films are showing improved performance in the visible range as compared with unpatterned NQD films without compromising the performance of the cell in the UV range of the solar spectrum. Also, an increase in power conversion efficiency by 12.5% is observed. Overall, an improvement of silicon solar cells performance using mist deposition of downshifting NQD films instead of spin-on coating as previously explored in other studies is demonstrated.
机译:本文关注的是连续沉积和图案沉积的雾沉积降档纳米晶体量子点(NQD)膜对单晶商业硅太阳能电池性能的影响。探索了不同厚度的NQD膜,以试图提高太阳光谱在紫外线(400 nm以下)范围内的电池效率。所获得的结果表明,与没有NQD膜的太阳能电池相比,使用50 nm厚的NQD膜观察到了最大的UV吸收,这反映出UV外量子效率平均提高了45%。与未构图的NQD膜相比,构图的NQD膜在可见光范围内显示出改进的性能,而不会损害电池在太阳光谱的紫外线范围内的性能。同样,观察到功率转换效率提高了12.5%。总体而言,已证明使用降档NQD膜的雾沉积而不是先前在其他研究中探讨的旋涂,可以改善硅太阳能电池的性能。

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