首页> 外文期刊>Organic Electronics >Origin Of Improvement In Device Performance Via The Modification Role Of Cesium Hydroxide Doped Tris(8-hydroxyquinoline) Aluminum Interfacial Layer On Ito Cathode In Inverted Bottom-emission Organic Light-emitting Diodes
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Origin Of Improvement In Device Performance Via The Modification Role Of Cesium Hydroxide Doped Tris(8-hydroxyquinoline) Aluminum Interfacial Layer On Ito Cathode In Inverted Bottom-emission Organic Light-emitting Diodes

机译:通过倒置底发射有机发光二极管中的Ito阴极上掺杂氢氧化铯的三(8-羟基喹啉)铝界面层的改性作用来改善器件性能的起源

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摘要

It has been found that cesium hydroxide (CsOH) doped tris(8-hydroxyquinoline) aluminum (Alq_3) as an interfacial modification layer on indium-tin-oxide (ITO) is an effective cathode structure in inverted bottom-emission organic light-emitting diodes (IBOLEDs). The efficiency and high temperature stability of IBOLEDs with CsOH:Alq_3 interfacial layer are greatly improved with respect to the IBOLEDs with the case of Cs_2CO_3:Alq_3. Herein, we have studied the origin of the improvement in efficiency and high temperature stability via the modification role of CsOH:Alq_3 interfacial layer on ITO cathode in IBOLEDs by various characterization methods, including atomic force microscopy (AFM), ultraviolet pho-toemission spectroscopy (UPS), X-ray photoemission spectroscopy (XPS) and capacitance versus voltage (C-V). The results clearly demonstrate that the CsOH:Alq_3 interfaciai modification layer on ITO cathode not only enhances the stability of the cathode interface and electron-transporting layer above it, which are in favor of the improvement in device stability, but also reduces the electron injection barrier and increases the carrier density for current conduction, leading to higher efficiency.
机译:已经发现,在铟锡氧化物(ITO)上作为界面改性层的氢氧化铯(CsOH)掺杂的三(8-羟基喹啉)铝(Alq_3)是有效的阴极结构,在倒置底部发射有机发光二极管中(IBOLED)。相对于在Cs_2CO_3:Alq_3情况下的IBOLED,大大提高了具有CsOH:Alq_3界面层的IBOLED的效率和高温稳定性。在本文中,我们通过原子力显微镜(AFM),紫外光发射光谱法(AFM),紫外光发射光谱法( UPS),X射线光发射光谱(XPS)以及电容与电压(CV)的关系。结果清楚地表明,ITO阴极上的C​​sOH:Alq_3界面改性层不仅增强了阴极界面和上方的电子传输层的稳定性,有利于器件稳定性的提高,而且降低了电子注入势垒并增加了用于电流传导的载流子密度,从而提高了效率。

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