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首页> 外文期刊>Optical Materials >Influence of annealing on the linear and nonlinear optical properties of Mn doped ZnO thin films examined by z-scan technique in CW regime
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Influence of annealing on the linear and nonlinear optical properties of Mn doped ZnO thin films examined by z-scan technique in CW regime

机译:z扫描技术在连续波方式下退火对Mn掺杂ZnO薄膜线性和非线性光学性质的影响

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摘要

We present the studies on the influence of annealing on the third-order nonlinear optical properties of RF magnetron sputtered manganese doped zinc oxide (MZO) thin films with different doping concentration. It is revealed that the incorporation of Mn into ZnO and annealing lead to prominent changes in the third order nonlinearity. Nonlinear optical measurements were carried out by employing the z-scan technique using a continuous wave (CW) He Ne laser of 633 nm. The z-scan results reveal that the films exhibit self-defocusing thermal nonlinearity. The third-order nonlinear optical susceptibility x((3)) was found to be of the order of 10(-3) esu and 10(-2) esu for annealed MZO thin films at 200 degrees C and 400 degrees C respectively. The dependence of grain size on the observed nonlinearity was revealed by atomic force microscopy analysis. Optical limiting studies were carried out for a range of input power levels and an optical limiting of about similar to 8 mW was observed indicating the possible application for photonic devices. (C) 2016 Elsevier B.V. All rights reserved.
机译:我们目前的研究对不同掺杂浓度的射频磁控溅射锰掺杂氧化锌(MZO)薄膜的三阶非线性光学特性的影响。结果表明,Mn掺入ZnO和退火导致三阶非线性的显着变化。非线性光学测量是通过使用633 nm连续波(CW)He Ne激光器的z扫描技术进行的。 Z扫描结果表明,这些膜表现出自散焦的热非线性。对于在200℃和400℃退火的MZO薄膜,发现三阶非线性光学磁化率x((3))分别约为10(-3)esu和10(-2)esu。通过原子力显微镜分析揭示了晶粒尺寸对所观察到的非线性的依赖性。在一定范围的输入功率水平上进行了光极限研究,观察到的光极限大约类似于8 mW,这表明可能在光子器件中应用。 (C)2016 Elsevier B.V.保留所有权利。

著录项

  • 来源
    《Optical Materials》 |2016年第8期|373-381|共9页
  • 作者单位

    Natl Univ Sci & Technol MISIS Leninskii Pr 4 Moscow 119049 Russia|Natl Inst Technol Karnataka Dept Phys Mat Res Lab Surathkal 575025 Karnataka India;

    Jain Univ Sch Engn & Technol Dept Phys Bangalore 562112 Karnataka India|Manipal Univ Manipal Inst Technol Dept Phys Nonlinear Opt Res Lab Manipal 576104 Karnataka India;

    Manipal Univ Manipal Inst Technol Dept Phys Nonlinear Opt Res Lab Manipal 576104 Karnataka India;

    Natl Inst Technol Karnataka Dept Phys Mat Res Lab Surathkal 575025 Karnataka India;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    MZO thin films; RF magnetron sputtering; Z-scan; Annealing; NLO; Optical limiting;

    机译:MZO薄膜;射频磁控溅射;Z扫描退火;NLO;光学限制;

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