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Structural and optical properties of p-quaterphenyl thin films and application in organic/inorganic photodiodes

机译:对四苯基薄膜的结构和光学性质及其在有机/无机光电二极管中的应用

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Para-quaterphenyl (p-4phenyl) thin films were deposited by the thermal evaporation method on glass/quartz substrates for structural and optical investigations. The XRD of p-4phenyl thin films showed that the as-deposited films have a monoclinic structure. The surface morphology of p-4phenyl thin film was studied using scanning electron microscope. The absorption spectrum of p-4phenyl thin film recorded in the wavelength range 200-2500 nm. Photoluminescence measurements revealed two emission peaks at 435 and 444 nm using N-2-laser (337.8 nm). The energy gap obtained from the absorption and photoluminescence data was found to be 2.87 and 2.74 eV respectively with Stokes shift value of 0.13 eV. The current-voltage characteristics of p-4phenyl/p-Si heterojunction have been recorded in the dark and under illumination of laser (337.8 nm). Responsivity, Detectivity, External quantum efficiency and Response speed of (Au/p-4phenyl/p-Si/AI) photodetector have been determined using different laser sources at -1 V bias. (C) 2016 Elsevier B.V. All rights reserved.
机译:通过热蒸发法在玻璃/石英基板上沉积对-季四苯基(p-4phenyl)薄膜,以进行结构和光学研究。对-4苯基薄膜的X射线衍射表明,所沉积的薄膜具有单斜晶结构。用扫描电子显微镜研究了p-4苯基薄膜的表面形貌。 p-4苯基薄膜的吸收光谱记录在200-2500 nm的波长范围内。使用N-2-激光(337.8 nm),光致发光测量显示在435和444 nm处有两个发射峰。从吸收和光致发光数据获得的能隙分别为2.87和2.74 eV,斯托克斯位移值为0.13 eV。在黑暗中和在激光(337.8 nm)照射下记录了p-4苯基/ p-Si异质结的电流-电压特性。 (Au / p-4苯基/ p-Si / AI)光电探测器的响应度,检测率,外部量子效率和响应速度已使用-1 V偏置下的不同激光源确定。 (C)2016 Elsevier B.V.保留所有权利。

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