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Improvement of AlGaN-based deep ultraviolet light-emitting diodes by using a graded AlGaN superlattice hole reservoir layer

机译:通过使用渐变的AlGaN超晶格空穴存储层来改进AlGaN基深紫外发光二极管

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摘要

The AlGaN-based deep ultraviolet light emitting diodes (DUV-LEDs) with a graded superlattice hole reservoir layer (HRL) can significantly enhance hole injection efficiency, compared with the traditional LED. We have systematically studied by APSYS software. The application of new structure can obtain higher output power and carrier concentrations, and further influence the carrier recombination rate. The DUV-LEDs with a graded superlattice HRL can obviously improve internal quantum efficiency (IQE) and alleviate efficiency droop. The improved performance is mainly attributed to the higher electron potential height and lower hole potential height, so it enhances electron confinement and hole injection. Thereby, the proposed structure effectively improve the photoelectric performance.
机译:与传统的LED相比,具有渐变超晶格空穴存储层(HRL)的基于AlGaN的深紫外发光二极管(DUV-LED)可以显着提高空穴注入效率。我们已经通过APSYS软件进行了系统的研究。新结构的应用可以获得更高的输出功率和载流子浓度,并进一步影响载流子复合率。具有分级超晶格HRL的DUV-LED可以明显提高内部量子效率(IQE)并减轻效率下降。性能的提高主要归因于较高的电子势能高度和较低的空穴势能高度,因此它增强了电子约束和空穴注入。因此,提出的结构有效地改善了光电性能。

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