Growth of the high reflectivity Bi_2O_3 glass films by atmospheric pressure halide CVD

摘要

We reported the results of an investigation into the preparation of amorphous Bi_2O_3 onto borosilicate glass substrate by means of atmospheric pressure halide chemical vapor deposition using BiI_3 and oxygen as a source materials. Obtained thin films lower than 475℃ was amorphous and it was almost transparent in infrared region. But the amorphous films are iodine-containing Bi_2O_3, as results of analysis by XRD and XPS.