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Efficient performance enhancement of GaN-based vertical light-emitting diodes coated with N-doped graphene quantum dots

机译:涂覆N掺杂石墨烯量子点的GaN基垂直发光二极管的有效性能增强

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摘要

Novel vertical light-emitting diodes (VLEDs) decorated with N-doped graphene quantum dots (N-GQDs) have been fabricated, based on the metal organic chemical vapor deposition method (MOCVD), wafer bonding technique, laser lift-off (LLO) technique, inductively coupled plasma (ICP) etching and impregnation processing. There is an obvious luminescence enhancement and resistance reduction for VLEDs after coating N-GQDs. The results show an improvement of light output power (LOP), dependent on the improvement of optical extraction efficiency and current spreading. The improvement of external quantum efficiency (EQE) is mainly owing to the roughened surfaces. Meanwhile, an enhancement of electroluminescence (EL) intensity and photoluminescence (PL) intensity has been achieved when the VLEDs were immersed in 0.9 mg/mL of N-GQDs solution, 4 times that of bare VLEDs. After coating N-GQDs, the performance of VLEDs is greatly improved, which could be attributed to the photons recovered by extracting light from waveguide modes.
机译:基于金属有机化学气相沉积法(MOCVD),晶圆键合技术,激光剥离(LLO)技术,制造了新型的以N掺杂的石墨烯量子点(N-GQDs)为装饰的垂直发光二极管(VLED)。感应耦合等离子体(ICP)蚀刻和浸渍处理技术。涂覆N-GQD后,VLED有明显的发光增强和电阻降低。结果表明,取决于光提取效率和电流扩展的改善,光输出功率(LOP)有所改善。外部量子效率(EQE)的提高主要归因于表面粗糙。同时,将VLED浸入0.9 mg / mL N-GQDs溶液中时,电致发光(EL)强度和光致发光(PL)强度得到了增强,是裸VLED的4倍。涂覆N-GQD后,VLED的性能大大提高,这可以归因于通过从波导模式中提取光而回收的光子。

著录项

  • 来源
    《Optical Materials》 |2019年第3期|468-472|共5页
  • 作者单位

    Univ Shanghai Sci & Technol, Sch Mat Sci & Engn, 516 JunGong Rd, Shanghai 200093, Peoples R China;

    Univ Shanghai Sci & Technol, Sch Mat Sci & Engn, 516 JunGong Rd, Shanghai 200093, Peoples R China;

    Univ Shanghai Sci & Technol, Sch Mat Sci & Engn, 516 JunGong Rd, Shanghai 200093, Peoples R China;

    Univ Shanghai Sci & Technol, Sch Mat Sci & Engn, 516 JunGong Rd, Shanghai 200093, Peoples R China;

    Univ Shanghai Sci & Technol, Sch Mat Sci & Engn, 516 JunGong Rd, Shanghai 200093, Peoples R China;

    Univ Shanghai Sci & Technol, Sch Mat Sci & Engn, 516 JunGong Rd, Shanghai 200093, Peoples R China|Shanghai Innovat Inst Mat, Shanghai 200444, Peoples R China;

    Univ Shanghai Sci & Technol, Sch Mat Sci & Engn, 516 JunGong Rd, Shanghai 200093, Peoples R China|Shanghai Innovat Inst Mat, Shanghai 200444, Peoples R China;

    Univ Shanghai Sci & Technol, Sch Mat Sci & Engn, 516 JunGong Rd, Shanghai 200093, Peoples R China|Shanghai Innovat Inst Mat, Shanghai 200444, Peoples R China;

    Univ Shanghai Sci & Technol, Sch Mat Sci & Engn, 516 JunGong Rd, Shanghai 200093, Peoples R China|Shanghai Innovat Inst Mat, Shanghai 200444, Peoples R China;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    GaN; Vertical light-emitting diodes; N-doped graphene quantum dots;

    机译:GaN;垂直发光二极管;n掺杂石墨烯量子点;

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