...
首页> 外文期刊>Optical engineering >Segmented subwavelength silicon gratings manufactured by high productivity microelectronic technologies for linear to radial/azimuthal polarization conversion
【24h】

Segmented subwavelength silicon gratings manufactured by high productivity microelectronic technologies for linear to radial/azimuthal polarization conversion

机译:通过高生产率微电子技术制造的分段亚波长硅光栅,用于线性到径向/方位极化转换

获取原文
获取原文并翻译 | 示例
           

摘要

A polarization rotation is realized by subwavelength binary gratings, where the round trip phases of the smallest grating modes are fixed to the smallest possible integer numbers of 2π allowing a phase difference of π between TE and TM polarizations and almost 100% transmission. The principle is applied to a polarization transformation in the 1030 to 1064-nm wavelength range, using a segmented polarization rotating element converting a linearly polarized incidence to a radial or azimuthal polarization distribution. The elevated costs of such kinds of polarization transformers based on assembled birefringent crystals are avoided by using mass-fabrication compatible silicon-on-insulator technology on a wafer scale. It shows the general potential of microelectronic technology, concerning the batch manufacturing of wavelength-scale diffractive, grating-based elements for processing free space waves.
机译:偏振旋转是通过亚波长二进制光栅实现的,其中最小光栅模式的往返相位固定为2π的最小可能整数,从而允许TE和TM偏振之间的π相差和几乎100%的透射率。该原理适用于1030至1064 nm波长范围内的偏振变换,它使用分段偏振旋转元件将线性偏振入射转换为径向或方位偏振分布。通过在晶片规模上使用大规模制造兼容的绝缘体上硅技术,可以避免这种基于组装的双折射晶体的偏振变压器的高昂成本。它显示了微电子技术的普遍潜力,涉及批量生产用于处理自由空间波的波长尺度衍射光栅基元件。

著录项

  • 来源
    《Optical engineering》 |2014年第10期|107105.1-107105.5|共5页
  • 作者单位

    Universite de Lyon a St-Etienne, Laboratoire Hubert Curien UMR CNRS 5516, 18 Rue du Professeur Benoit Lauras, 42000 Saint-Etienne, France;

    Laboratoire d'electronique et de technologie de l'information CEA/Leti, 17 Rue des Martyrs, 38054 Grenoble, France;

    Laboratoire d'electronique et de technologie de l'information CEA/Leti, 17 Rue des Martyrs, 38054 Grenoble, France;

    Laboratoire d'electronique et de technologie de l'information CEA/Leti, 17 Rue des Martyrs, 38054 Grenoble, France;

    Laboratoire d'electronique et de technologie de l'information CEA/Leti, 17 Rue des Martyrs, 38054 Grenoble, France;

    Universite de Lyon a St-Etienne, Laboratoire Hubert Curien UMR CNRS 5516, 18 Rue du Professeur Benoit Lauras, 42000 Saint-Etienne, France;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    polarization conversion; subwavelength grating; effective index; radial polarization; azimuthal polarization; silicon-on-insulator;

    机译:极化转换;亚波长光栅有效指标径向极化方位极化绝缘体上硅;

相似文献

  • 外文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号