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首页> 外文期刊>Nuclear Instruments & Methods in Physics Research. B, Beam Interactions with Materials and Atoms >Determination of nitrogen-related defects in N-implanted ZnO films by dynamic cathodoluminescence
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Determination of nitrogen-related defects in N-implanted ZnO films by dynamic cathodoluminescence

机译:动态阴极发光法测定N注入ZnO薄膜中氮相关缺陷

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摘要

Visible bands arising from N-related defects are investigated by dynamic cathodoluminescence (CL) and Gaussian deconvolution. The intensity of the red band increases while that of the ultraviolet (UV) band decreases. The intensity of the yellow band also decreases but only slightly as a function of the electron bombardment cycle. The CL behavior of N-doped ZnO after post-annealing in N-2 at high temperature reveals that the N-related defects cannot be easily compensated. The results also confirm the assignment of the N-related defects and are in agreement with the theoretical prediction about Zn-N bonding. Our data provide some clues to the mechanism of the conversion of ZnO into p-type by nitrogen doping. (c) 2005 Elsevier B.V. All rights reserved.
机译:通过动态阴极发光(CL)和高斯反卷积研究了由N相关缺陷引起的可见带。红色波段的强度增加,而紫外线(UV)波段的强度减小。黄带的强度也随电子轰击周期而减小,但仅略有减小。在高温下在N-2中进行退火后,N掺杂的ZnO的CL行为表明,与N相关的缺陷不能轻易得到补偿。结果也证实了N相关缺陷的分配,并且与关于Zn-N键合的理论预测一致。我们的数据为通过氮掺杂将ZnO转化为p型的机理提供了一些线索。 (c)2005 Elsevier B.V.保留所有权利。

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