机译:钨表面累积氦轰击的分子动力学模拟
Key Lab for Radiation Physics and Technology, Institute of Nuclear Science and Technology, Sichuan University, Chengdu 610061, China;
Key Lab for Radiation Physics and Technology, Institute of Nuclear Science and Technology, Sichuan University, Chengdu 610061, China;
Key Lab for Radiation Physics and Technology, Institute of Nuclear Science and Technology, Sichuan University, Chengdu 610061, China;
Key Lab for Radiation Physics and Technology, Institute of Nuclear Science and Technology, Sichuan University, Chengdu 610061, China;
Molecular dynamics; Tungsten surface; Helium; 111 Crowdion; Radiation damage;
机译:氦轰击下钨溅射产量的温度效应的分子动力学模拟
机译:低能氦原子轰击对钨表面的辐射损伤-分子动力学研究
机译:温度对钨表面低能氦轰击的分子动力学研究
机译:钨散装材料中氦的扩散和聚集行为的分子动力学模拟
机译:使用分子动力学模拟轰击石墨和无定形碳表面:建立更现实的实验模型
机译:钨中氦行为的最新标准和加速分子动力学模拟综述
机译:累积氦轰击的分子动力学模拟 钨表面