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机译:通过100 keV / u质子,C,N,O离子测量_(79)Au,_(82)Pb和_(83)Bi的线分辨M壳X射线产生截面
Department of Basic and Applied Sciences, Punjabi University, Patiala 147002, India;
Nuclear Physics Division, Bhabha Atomic Research Centre, Trombay, Mumbai 400 085, India;
Department of Nuclear and Atomic Physics, Tata Institute of Fundamental Research, Colaba, Mumbai 400005, India;
Department of Basic and Applied Sciences, Punjabi University, Patiala 147002, India;
Department of Basic and Applied Sciences, Punjabi University, Patiala 147002, India;
Department of Basic and Applied Sciences, Punjabi University, Patiala 147002, India;
Department of Nuclear and Atomic Physics, Tata Institute of Fundamental Research, Colaba, Mumbai 400005, India;
X-ray production cross sections; Ion-atom interaction processes; ECPSSR; Fluorescence and Coster-Kronig yields;
机译:M X射线产生横截面在<下标> 79 下标> Au和<下标> 83 下标> BI引起的50-300kev质子
机译:M X射线产生横截面在<下标> 79 下标> Au和<下标> 83 下标> BI引起的50-300kev质子
机译:Ta,W,Pt,Au,Pb和Bi的L-副壳和M-壳总X射线产生截面为0.7-2.4 MeV质子
机译:M-Shell电离横截面在TM上进行75-300keV质子,使用厚薄靶
机译:0.4和铀M壳X射线产生的横截面,用于0.4–4.0 MeV质子,0.4–6.0 MeV氦离子,4.5–11.3 mev碳离子和4.5–13.5 MeV氧离子
机译:在... ... ... ...公式通道中质子-质子碰撞中...通道的...公式... ...公式...生产横截面的测量和...公式...以及三重量规联轴器的组合约束
机译:m-shell X射线在₇₉au,₈2pb,₈3Bi和₉2U的薄靶中产生0.3-2.6-meV 11 H +和2 He +离子的横截面
机译:用于25-meV碳和32-meV氧离子的Nd,Gd,Ho,Yb,au和pb的L-shell X射线生产截面