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Effect of the gas contamination on CF_4 primary and secondary scintillation

机译:气体污染对CF_4初次和二次闪烁的影响

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摘要

The effect of gas contamination on light emission properties of CF_4 is presented. The study was performed in the UV (220-450 nm) and visible (450-800 nm) wavelength ranges and the relative light emission intensity and effective decay times were measured. Cas contamination effects, as well as the effect of controllable addition of small quantities of gas admixtures were investigated for both the primary and secondary scintillation. The primary ionization was produced by alpha-particles from an Am-241 alpha source, and MSGC plates were used for electron multiplication and secondary light production. Two types of commercial gas purifiers were tested.
机译:提出了气体污染对CF_4发光特性的影响。该研究是在紫外线(220-450 nm)和可见光(450-800 nm)波长范围内进行的,并测量了相对发光强度和有效衰减时间。研究了一次和二次闪烁的Cas污染效应以及可控添加少量气体混合物的效应。初级电离是由来自Am-241α源的α粒子产生的,MSGC板用于电子倍增和次级光的产生。测试了两种类型的商用气体净化器。

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