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Deuterium as a cleaning gas for ITER first mirrors: experimental study on beryllium deposits from laboratory and JET-ILW

机译:氘作为ITER第一面镜的清洁气体:来自实验室和JET-ILW的铍沉积物的实验研究

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Cleaning techniques for metallic first mirrors are needed in more than 20 optical diagnostic systems from ITER to avoid reflectivity losses. Plasma sputtering is considered as one of the most promising techniques to remove deposits coming from the main wall (mainly beryllium and tungsten). Previous plasma cleaning studies were conducted on mirrors contaminated with beryllium and tungsten where argon and/or helium were employed as process gas, demonstrating removal of contamination and recovery of optical properties. Still, both abovementioned process gases have a non-negligible sputtering yield on mirrors. In this work, we explored the possibility to use a sputter gas having a small impact on mirrors while being efficient on Be deposits, e.g. deuterium. Two sputtering regimes were studied, on laboratory deposits as well as on mirrors exposed in .TET-ILW, namely physical sputtering (220eV ion energy) and chemically assisted physical sputtering (60 eV ion energy) using capacitively coupled plasma with radio frequency. The removal of Be and mixed Be/W contaminants, as well as the recovery of reflectivity, was achieved when deuterium was employed at 220eV while cleaning at 60eV was only fully efficient on laboratory beryllium deposits. On mirrors exposed in JET-ILW, the situation is more complex due to the presence of tungsten in the contaminant film, leading to the formation of a tungsten enriched surface that is not easily sputtered, especially at 60eV.
机译:ITER的20多个光学诊断系统需要使用金属第一镜的清洁技术,以避免反射率损失。等离子体溅射被认为是去除来自主壁(主要是铍和钨)的沉积物的最有前途的技术之一。先前的等离子体清洁研究是在被铍和钨污染的镜子上进行的,在这些镜子上,氩气和/或氦气用作处理气体,证明了去除污染物和恢复光学性能。仍然,上述两种处理气体在反射镜上的溅射产率均不可忽略。在这项工作中,我们探索了使用对镜子影响很小,同时对Be沉积有效的溅射气体的可能性,例如氘。在实验室沉积物和.TET-ILW中暴露的镜子上,研究了两种溅射方式,即物理溅射(220eV离子能量)和化学辅助物理溅射(60eV离子能量),其使用了具有射频电容耦合的等离子体。当氘在220eV下使用时,去除了Be和混合的Be / W污染物,并恢复了反射率,而60eV上的清洗仅对实验室铍沉积物完全有效。在JET-ILW中暴露的镜子上,由于污染物膜中存在钨,因此情况更加复杂,导致形成了不易溅射的富钨表面,尤其是在60eV时。

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