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Multigate transistors as the future of classical metal-oxide-semiconductor field-effect transistors

机译:多栅极晶体管是经典金属氧化物半导体场效应晶体管的未来

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摘要

For more than four decades, transistors have been shrinking exponentially in size, and therefore the number of transistors in a single microelectronic chip has been increasing exponentially. Such an increase in packing density was made possible by continually shrinking the metal-oxide-semiconductor field-effect transistor (MOSFET). In the current generation of transistors, the transistor dimensions have shrunk to such an extent that the electrical characteristics of the device can be markedly degraded, making it unlikely that the exponential decrease in transistor size can continue. Recently, however, a new generation of MOSFETs, called multigate transistors, has emerged, and this multigate geometry will allow the continuing enhancement of computer performance into the next decade.
机译:超过四十年来,晶体管的尺寸已呈指数级缩小,因此单个微电子芯片中的晶体管数量呈指数级增长。通过不断缩小金属氧化物半导体场效应晶体管(MOSFET),可以实现这种堆积密度的增加。在当前的晶体管的产生中,晶体管的尺寸已经缩小到这样的程度,使得器件的电特性可能显着降低,从而使得晶体管尺寸的指数减小不可能继续下去。但是,最近出现了新一代的MOSFET,称为多栅晶体管,这种多栅几何形状将使计算机性能在未来十年内得到持续提高。

著录项

  • 来源
    《Nature》 |2011年第7373期|p.310-316|共7页
  • 作者单位

    Tyndall National Institute, University College Cork, Lee Maltings, Dyke Parade, Cork, Ireland;

    Tyndall National Institute, University College Cork, Lee Maltings, Dyke Parade, Cork, Ireland;

    Tyndall National Institute, University College Cork, Lee Maltings, Dyke Parade, Cork, Ireland;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);美国《化学文摘》(CA);
  • 原文格式 PDF
  • 正文语种 eng
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  • 入库时间 2022-08-18 02:54:52

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