首页> 外文期刊>Naturwissenschaften >The Basic Mechanism of Glass Polishing
【24h】

The Basic Mechanism of Glass Polishing

机译:玻璃抛光的基本机理

获取原文
获取原文并翻译 | 示例
       

摘要

As early as 1941 Klemm and Smekal (1941) wrote in a contribution to this journal that etching of well-polished glass surfaces reveals hidden "polishing scratches" caused by the action of grains in the polishing compound. These authors contended that polishing grains must be harder than the glass that is to be polished, and that polishing is a continuous thermoplastic flattening or smoothing of surface irregularities due to a succession of crisscrossing smooth, very small scratch marks caused by the hard corner points of the polishing grains and with a minimum of material removal. They later expanded their theory of the basic mechanism of polishing (Klemm 1950; Smekal 1950); Smekal added the opinion that any grinding compound can be used also for polishing, provided that its grains are fine enough.
机译:早在1941年,Klemm和Smekal(1941)就在该期刊的一篇文章中写道,对抛光的玻璃表面进行蚀刻会发现由于抛光剂中颗粒的作用而导致的隐藏的“抛光划痕”。这些作者认为,抛光晶粒必须比要抛光的玻璃坚硬,并且抛光是连续的热塑性平整或表面不规则性的平滑处理,这是由于连续的纵横交错的光滑,非常小的划痕引起的,这些划痕是由抛光颗粒,去除的材料最少。后来他们扩展了关于抛光基本机理的理论(Klemm 1950; Smekal 1950)。 Smekal补充说,任何磨料也可用于抛光,只要其晶粒足够细即可。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号