首页> 外文期刊>Mineralogical Journal >Ab initio calculation of ~(29)Si NMR chemical shifts for the clusters of Si (OH)_4, Si (OH)_5~- and Si (OH)_6~(-2)
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Ab initio calculation of ~(29)Si NMR chemical shifts for the clusters of Si (OH)_4, Si (OH)_5~- and Si (OH)_6~(-2)

机译:Si(OH)_4,Si(OH)_5〜-和Si(OH)_6〜(-2)簇的〜(29)Si NMR化学位移从头算

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摘要

In order to identify five-coordinated Si(Si~V) species in crystalline and amorphous silicates by NMR spectroscopy, ~(29)Si NMR chemical shifts for the clusters of Si(CH_3)_4 (TMS), Si(OH)_4, Si(OH)_5~- and Si(OH)_6~(-2) were calculated using ab initio molecular orbital theory. The calculated shifts relative to TMS cluster were -71.7 and —179.0 ppm for Si (OH)_4 and Si(OH)_6~(-2), respectively, and are in good agreement with observed shifts. The calculated shift for Si(OH)_5~- was -127.4 ppm, falls just between the shifts of Si(OH)_4 and Si(OH)_6~(-2). The chemical shift for Si~V species in polymerized silicates is expected to appear at about — 150 ppm, if the effect of polymerization is considered. Present calculation thus supports the assignment of — 150 ppm peak as Si~V species, which has been found in the alkali-silicate glasses quenched from high pressures.
机译:为了通过NMR光谱法鉴定晶体和非晶硅酸盐中的五配位Si(Si〜V)物种,Si(CH_3)_4(TMS),Si(OH)_4的簇的〜(29)Si NMR化学位移,使用从头算分子轨道理论计算了Si(OH)_5〜-和Si(OH)_6〜(-2)。 Si(OH)_4和Si(OH)_6〜(-2)的相对于TMS簇的位移分别为-71.7和-179.0 ppm,与观察到的位移非常吻合。 Si(OH)_5〜-的计算位移为-127.4 ppm,恰好介于Si(OH)_4和Si(OH)_6〜(-2)的位移之间。如果考虑到聚合作用,则预计聚合硅酸盐中Si〜V物种的化学位移约为150 ppm。因此,目前的计算支持将-150 ppm峰指定为Si〜V物种,这是在高压淬火的碱金属硅酸盐玻璃中发现的。

著录项

  • 来源
    《Mineralogical Journal》 |1996年第1期|p.1-8|共8页
  • 作者

    Masami KANZAKI;

  • 作者单位

    Institute for Study of the Earth's Interior, Okayama University, Misasa, Tottori 682-01, Japan;

  • 收录信息
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 矿物学;
  • 关键词

  • 入库时间 2022-08-18 00:24:23

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