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首页> 外文期刊>Microwave and Wireless Components Letters, IEEE >The Kink Phenomenon in the Transistor ${rm S} _{22}$: A Systematic and Numerical Approach
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The Kink Phenomenon in the Transistor ${rm S} _{22}$: A Systematic and Numerical Approach

机译:晶体管$ {rm S} _ {22} $中的扭结现象:系统和数值方法

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摘要

This letter provides a valuable technique for evaluating the size and the shape of the kink effect in ${rm S} _{22}$ for microwave transistors. Since this phenomenon can be detected as the appearance of a concave shape in ${rm Im}({rm S} _{22})$ versus ${rm Re}({rm S} _{22})$, the second derivative of such a function is exploited for defining a set of parameters to fully and systematically characterize it. The effectiveness of the developed technique is demonstrated by its application to quantify the increase of the kink effect with the gate periphery for 0.15 $mu{rm m}$ GaAs HEMTs.
机译:这封信提供了一种有价值的技术,可用于评估微波晶体管在$ {rm S} _ {22} $中扭结效应的大小和形状。由于此现象可以检测为$ {rm Im}({rm S} _ {22})$与$ {rm Re}({rm S} _ {22})$中凹形的出现,因此第二个利用该函数的导数来定义一组参数,以全面,系统地表征该参数。通过应用该技术量化了0.15μmurmrmGaAs HEMT的栅极周边的扭结效应的增加,证明了该技术的有效性。

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