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Thermo-mechanical reliability during technology development of power chip-on-board assemblies with encapsulation

机译:带封装的功率板上芯片组件技术开发过程中的热机械可靠性

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摘要

In this paper we examine the thermo-mechanical reliability of polymer-encapsulated chip-on-board (COB) assemblies for power applications by simulation and experiment. Thereby the focus is set on the low cycle fatigue failure behaviour of the die-attach material under thermal cycling conditions. As die-attach material different solder materials and Ag-filled thermal adhesives have been used. The encapsulation was performed with a soft silicone-based and hard silica-reinforced epoxy-based material, respectively. An other process variable takes into account die-tilt. The study was carried out as a feasibility analysis in the course of a COB technology development. To this end lifetime models have been employed to correlate crack growth in the, i.e. attach to a computational accumulative failure criterion which allows to consistently describe ad predict quantitatively the lifetime of the assemblies. Thereby a considerable influence of the encapsulation was found. In particular it could be shown that a hard encapsulation largely increases reliability for solder die-attach.
机译:在本文中,我们通过仿真和实验研究了用于电源应用的聚合物封装的板上芯片(COB)组件的热机械可靠性。因此,焦点集中在热循环条件下芯片附接材料的低循环疲劳破坏行为。作为管芯连接材料,已使用了不同的焊料材料和填充有Ag的热粘合剂。分别用基于软硅酮的材料和基于硬硅石增强的环氧的材料进行封装。另一个过程变量考虑了模具倾斜。这项研究是在COB技术开发过程中进行的可行性分析。为此,已经采用了寿命模型来关联裂纹扩展,即附加到计算累积破坏准则,该准则允许一致地定量地描述和预测组件的寿命。由此发现了封装的相当大的影响。特别地,可以表明,硬封装大大增加了焊料管芯附接的可靠性。

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  • 来源
    《Microsystem Technologies》 |2009年第9期|1467-1478|共12页
  • 作者单位

    Fraunhofer Institut Zuverlässigkeit und Mikrointegration Volmerstrasse 9 B 12489 Berlin Germany;

    Fraunhofer Institut Zuverlässigkeit und Mikrointegration Volmerstrasse 9 B 12489 Berlin Germany;

    HS Elektronik Systeme GmbH Industriestrasse 18 86720 Nördlingen Germany;

    Technische Universität Berlin Forschungsschwerpunkt Technologien der Mikroperipherik Gustav-Meyer-Allee 25 13355 Berlin Germany;

    Fraunhofer Institut Zuverlässigkeit und Mikrointegration Volmerstrasse 9 B 12489 Berlin Germany;

    Fraunhofer Institut Zuverlässigkeit und Mikrointegration Volmerstrasse 9 B 12489 Berlin Germany;

    Fraunhofer Institut Zuverlässigkeit und Mikrointegration Volmerstrasse 9 B 12489 Berlin Germany;

    Fraunhofer Institut Zuverlässigkeit und Mikrointegration Volmerstrasse 9 B 12489 Berlin Germany;

    HS Elektronik Systeme GmbH Industriestrasse 18 86720 Nördlingen Germany;

    Fraunhofer Institut Zuverlässigkeit und Mikrointegration Volmerstrasse 9 B 12489 Berlin Germany;

    Technische Universität Berlin Forschungsschwerpunkt Technologien der Mikroperipherik Gustav-Meyer-Allee 25 13355 Berlin Germany;

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