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Electroosmotic flow profile distortion due to Laplace pressures at the end reservoirs

机译:末端储层的拉普拉斯压力导致电渗流剖面变形

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The build-up of pressure-driven backflows is a known drawback to electroosmotic plug flow. We have studied the characteristic time constant of these pressure gradients build-up as a function of various geometrical variables of the problem through mu PIV measurements. Previous models based on hydrostatic pressure difference ( syphoning) cannot explain the dynamics of our experimental results. We have developed a model that relates these pressure-driven backflows to Laplace pressures, due to changes in the interface radii of curvature at the reservoirs. This model leads to an equation which was solved both numerically and, after linearisation, analytically. The characteristic time constants obtained show much better agreement with experimental data. Therefore, this model allows for predicting the time during which an acceptable electroosmotic flow profile will last for a given microchannel-reservoir design.
机译:压力驱动回流的积累是电渗塞流的已知缺点。我们已经通过μPIV测量研究了这些压力梯度累积的特征时间常数,作为该问题的各种几何变量的函数。以前基于静水压差(虹吸)的模型无法解释我们实验结果的动态。我们已经开发了一个模型,该模型将这些压力驱动的回流与Laplace压力相关联,这归因于储层处的曲率界面半径的变化。该模型导致了一个方程,该方程在数值上以及线性化之后都可以通过解析求解。获得的特征时间常数显示出与实验数据更好的一致性。因此,该模型可以预测给定的微通道储层设计可接受的电渗流剖面持续的时间。

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