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首页> 外文期刊>Microelectronics Journal >Study on the Al/silicon rich oxide/Si structure as a surge suppressor, DC, frequency response and modeling
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Study on the Al/silicon rich oxide/Si structure as a surge suppressor, DC, frequency response and modeling

机译:铝/富硅氧化物/硅结构作为电涌抑制器的研究,直流,频率响应和建模

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摘要

In this work the possibility of using the Al/SRO/Si device as a surge suppressor is studied. DC, AC, and the frequency response of the device were investigated. Also the device was exposed to high voltage peaks. The High voltage peaks were generated using the human body model. Two devices were tested: simple MOS like capacitors, and input pads made of Al/SRO/Si connected to the gate of MOS transistors. Results show that these devices can uphold voltage peaks as big as 66 MV/cm and that they can be used for low frequency applications. It is also shown that, transistor gates connected to these input pads support higher voltage peaks compared with gates connected to standard input pad.
机译:在这项工作中,研究了将Al / SRO / Si器件用作电涌抑制器的可能性。研究了DC,AC和设备的频率响应。器件也暴露在高电压峰值下。使用人体模型生成高压峰。测试了两种设备:简单的MOS(如电容器)和由Al / SRO / Si制成的输入焊盘,连接到MOS晶体管的栅极。结果表明,这些器件可以承受高达66 MV / cm的电压峰值,并且可以用于低频应用。还显示,与连接到标准输入焊盘的栅极相比,连接到这些输入焊盘的晶体管栅极支持更高的电压峰值。

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