Fabrication of size-controllable nanofluidic channels using angled physical vapor deposition

摘要

In this paper, we demonstrate a new and simple method to achieve ultrasmall nanochannels downing size to about 50 nm with well-controlled dimensions in large area by using NIL and angled physical vapor deposition (PVD). The polymer SU-8 nanogratings substrate is fabricated using NIL. After NIL, oblique angle ion beam sputtering of silicon oxide was used, in a single step, to reduce the cross section of the SU-8 imprinted trenches and seal the channels at the same time. During this process, the sidewalls of any trench will shadow the evaporation and most of the silicon oxide film will be deposited on the side-walls at the top of the trench, therefore, the shadow area will be protected and ultimately formed as sealed nanochannels on substrate. The advantage of this process is that the line width can be adjustable simply by controlling the deposition as well as the imprint depth, offering an alternative solution for high-resolution and low-cost fabrication of nanofluidic chip. The method is applicable for most substrates and cover layer, therefore, it provides a new way to produce size reduction and size controlling of nan-opatterns for various material.