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Linear inductive antenna design for large area flat panel display plasma processing

机译:用于大面积平板显示器等离子处理的线性感应天线设计

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摘要

Two different internal-type linear inductive antenna arrangements, that is, parallel and anti-paraliel antenna arrangements having different current directions between adjacent antennas were investigated for a large area plasma source having the size of 1020 mm × 830 mm. The electric field profile and plasma density of Ar calculated by the F2L code showed consistent results with the experimental results on the plasma density and processing results. The results showed that the anti-parallel antenna arrangement showed better plasma uniformity compared to the parallel antenna arrangement due to the destructive E_z-field between adjacent antennas even though the destructive E_z-field decreases the plasma density at the center of the chamber.
机译:对于尺寸为1020 mm×830 mm的大面积等离子体源,研究了两种不同的内部线性感应天线布置,即相邻天线之间具有不同电流方向的平行和反平行天线布置。用F2L代码计算出的Ar的电场分布和等离子体密度与等离子体密度和加工结果的实验​​结果相吻合。结果表明,即使相邻天线之间的破坏性E_z场降低了腔室中心的等离子体密度,反平行天线结构也比并行天线布置具有更好的等离子体均匀性,这是因为相邻天线之间的破坏性E_z场。

著录项

  • 来源
    《Microelectronic Engineering》 |2012年第1期|p.133-137|共5页
  • 作者单位

    Department of Materials Science and Engineering, Sungkyunkwan University. Suwon, Gyeunggi-do 440-746, South Korea;

    Department of Materials Science and Engineering, Sungkyunkwan University. Suwon, Gyeunggi-do 440-746, South Korea;

    Department of Materials Science and Engineering, Sungkyunkwan University. Suwon, Gyeunggi-do 440-746, South Korea;

    Department of Materials Science and Engineering, Sungkyunkwan University. Suwon, Gyeunggi-do 440-746, South Korea,SKKU Advanced Institute of Nanotechnology (SAINT), Sungkyunkwan University, Suwon, Gyeunggi-do 440-746, South Korea;

    Department of Electronic and Electrical Engineering, Pohang University of Science and Technology, Pohang 790-784, South Korea;

    Department of Electronic and Electrical Engineering, Pohang University of Science and Technology, Pohang 790-784, South Korea;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    plasma; etching; uniformity;

    机译:等离子体;蚀刻均匀度;

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