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首页> 外文期刊>Microelectronic Engineering >Interface state density dependence on detection process in single electron photo-detector (photo-SET)
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Interface state density dependence on detection process in single electron photo-detector (photo-SET)

机译:界面态密度取决于单电子光电探测器(photo-SET)中的探测过程

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摘要

In this paper, we report the effect of optical power on interface state density (D-it) for the ultrasensitive single electron photodetector (photo-SET). To perform this work, Conductance-Capacitance-Voltage (C-G-V) techniques have been used, which form a method for the characterization of interface traps in MIS structures, taking into account the effect of the series resistance (R-s) at room temperature. To calculate the value of the density of interface states, (C-G-V) sweeps need to be corrected, analyzed and all extracted parameters would need to be recorded. Using Hill-Coleman method and a program developed using MATLAB, the calculated value of these interface state density (D-it) at 1 MHz was 2.4 . 10(12) eV(-1) cm(-2). The value of the interface state density (D-it) increase with increasing optical power. (C) 2016 Elsevier B.V. All rights reserved.
机译:在本文中,我们报告了光功率对超灵敏单电子光电探测器(photo-SET)的界面态密度(D-it)的影响。为了执行这项工作,已经使用了电导-电容-电压(C-G-V)技术,该技术考虑了室温下的串联电阻(R-s)的影响,形成了表征MIS结构中界面陷阱的方法。要计算界面状态的密度值,需要校正,分析(C-G-V)扫描,并记录所有提取的参数。使用Hill-Coleman方法和使用MATLAB开发的程序,这些接口状态密度(D-it)在1 MHz下的计算值为2.4。 10(12)eV(-1)厘米(-2)。界面状态密度(D-it)的值随光功率的增加而增加。 (C)2016 Elsevier B.V.保留所有权利。

著录项

  • 来源
    《Microelectronic Engineering》 |2016年第6期|151-154|共4页
  • 作者单位

    Equipe Composant Elect Nabeul UR11ES89, Campus El Merazka, Nabeul 8000, Tunisia;

    Equipe Composant Elect Nabeul UR11ES89, Campus El Merazka, Nabeul 8000, Tunisia;

    Equipe Composant Elect Nabeul UR11ES89, Campus El Merazka, Nabeul 8000, Tunisia|INSA Lyon, UMR5270, Inst Nanotechnol Lyon Site INSA, F-69691 Villeurbanne, France;

    Equipe Composant Elect Nabeul UR11ES89, Campus El Merazka, Nabeul 8000, Tunisia;

    Univ Sherbrooke, J1KOA5, Inst Interdisciplinaire Innovat Technol 3IT, Sherbrooke, PQ, Canada;

    INSA Lyon, UMR5270, Inst Nanotechnol Lyon Site INSA, F-69691 Villeurbanne, France;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    Single electron photodetectors; Capacitance voltage measurements; Conductance voltage measurements; Interface states density;

    机译:单电子光电探测器;电容电压测量;电导电压测量;界面态密度;

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