...
首页> 外文期刊>Journal of Microelectromechanical Systems >A Scalable, Hierarchical Rib Design for Larger-Area, Higher-Porosity Nanoporous Membranes for the Implantable Bio-Artificial Kidney
【24h】

A Scalable, Hierarchical Rib Design for Larger-Area, Higher-Porosity Nanoporous Membranes for the Implantable Bio-Artificial Kidney

机译:用于植入生物人工肾的较大面积,高孔隙纳米多孔膜的可扩展性等级肋骨设计

获取原文
获取原文并翻译 | 示例
   

获取外文期刊封面封底 >>

       

摘要

Silicon nanoporous membranes provide the fundamental underlying technology for the development of an implantable bio-artificial kidney. These membranes, which are comprised of micromachined slit-pores that are nominally 10 nm wide, allow for high-efficiency blood filtration as well as immunoprotection for encapsulated cells. Our approach takes advantage of well-established semiconductor fabrication technology to give us precise dimensional control over pore widths, thereby enabling a highly selective filtration function and a clear path towards further miniaturization. This work builds on our prior results on "ribbed nanoporous membranes" by adding a second-level hierarchy of significantly taller "mega-ribs" to further strengthen the membranes. Relying on a two-step Deep Reactive Ion Etch (DRIE) process, we etch 4 mu m-deep as well as 40 mu m-deep trenches into a silicon substrate, grow a thermal oxide liner, and deposit a layer of polysilicon into this "mold" to form membranes which, when released after a backside DRIE etch, feature a network of reinforcing ribs on the underside. We have fabricated and tested freestanding membrane spans that are up to 14 times wider than before, with approximately double the measured permeability per unit area. The new architecture can also improve cross-membrane mass-transfer rates and reduce chip-fabrication costs. [2020-0170]
机译:硅纳米多孔膜为植入生物人工肾的发展提供了基本的潜在技术。这些膜由名义上为10nm宽的微加工狭缝孔组成,允许高效血液过滤以及包封细胞的免疫润孔。我们的方法利用了良好的半导体制造技术,以使我们对孔宽度的精确尺寸控制,从而能够实现高度选择性的过滤功能和朝向进一步小型化的透明路径。通过增加“罗纹纳米孔膜”的前期较高的“Mega-Ribs”的第二级层次,这项工作建立在我们的先前结果上,以进一步加强膜。依靠两步深反应离子蚀刻(DRIE)工艺,我们蚀刻4μm-深的以及40μm深沟槽进入硅衬底,生长热氧化物衬垫,并将一层多晶硅沉积到其中“模具”形成膜,当后侧DRIE蚀刻后释放时,在下侧具有加强肋的网络。我们已经制造并测试了独立式膜跨度,比以前宽的宽度高达14倍,每单位面积的测量渗透率大约是一倍。新型结构还可以提高跨膜传质速率并减少芯片制造成本。 [2020-0170]

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号