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Resistivity dependence of gauge factor of polysilicon strain gauge

机译:多晶硅应变片的应变片电阻率依赖性

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摘要

A method to estimate the gauge factor of a polysilicon strain gauge at the wafer level is proposed. It is difficult to measure the gauge factor of anpolysilicon strain gauge formed on the silicon diaphragm of a mechanical transducer because the polysilicon strain gauge is integrated into thendiaphragm. The authors fabricated polysilicon strain gauges of various shapes and implanted with various concentrations of boron, andnmeasured the gauge factor of each strain gauge. In the experimental results, the gauge factors are calculated by multiplying the resistivity coefficientnof gauge factor (RCGF) determined by the boron concentration and resistivity of the polysilicon strain gauge. The authors also determinednthe RCGF of the polysilicon strain gauges implanted with boron concentrations of 1.0 × 1019, 1.5 × 1019 and 1.0 × 1020 cm23.
机译:提出了一种估算晶圆级多晶硅应变片的应变片系数的方法。由于多晶硅应变仪已集成到膜片中,因此很难测量形成在机械换能器硅膜片上的多晶硅应变仪的应变系数。作者制造了各种形状的多晶硅应变仪,并注入了各种浓度的硼,并测量了每个应变仪的应变系数。在实验结果中,应变系数是通过将应变系数的电阻率系数n(RCGF)乘以多晶硅应变仪的硼浓度和电阻率来计算的。作者还确定了植入硼浓度为1.0×1019、1.5×1019和1.0×1020 cm23的多晶硅应变仪的RCGF。

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  • 来源
    《Micro & Nano Letters》 |2010年第3期|p.189-192|共4页
  • 作者

    Y. Kim and S. Kwon;

  • 作者单位

    Department of Aerospace Engineering, School of Mechanical, Aerospace and Systems Engineering, KAIST, 335 Gwahak-ro,nYuseong-gu, Daejeon 305-701, Republic of KoreanE-mail: trumpet@kaist.ac.kr;

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