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Effect of high-temperature glass frit bonding process on performance of polysilicon strain gauges

机译:高温玻璃粉粘接工艺对多晶硅应变片性能的影响

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摘要

This Letter presents the effect of high-temperature glass frit bonding conditions on the resistivity coefficient of gauge factor (RCGF), resistivity and gauge factor of polysilicon strain gauges. In previous works, the authors proposed the use of thin polysilicon strain gauges that were bonded onto metal structures with an inorganic glass frit adhesive. However, this glass frit bonding process was carried out at a high temperature, which could cause performance changes of the polysilicon strain gauges in terms of their RCGF, resistivity and gauge factor. To investigate the effect of the glass frit bonding process, the RCGF, resistivity and gauge factor of the polysilicon strain gauge before and after heat treatment by the conventional Al annealing condition and the glass frit bonding condition were compared and evaluated. In the results, large resistivity and gauge factor deviations in the polysilicon strain gauges that were not heat treated were observed. In spite of these large deviations, a linear relationship between the resistivity and the gauge factor was observed. After the polysilicon strain gauges were heat treated by the conventional Al annealing condition and the glass frit bonding condition, the deviations in the values of the resistivity and gauge factor became more uniform than those seen in the strain gauges that were not heat treated. The RCGFs of the polysilicon strain gauges heat treated with the Al annealing condition and the glass frit bonding condition coincided with that of the gauge that was not heat treated.
机译:这封信介绍了高温玻璃粉粘结条件对应变系数的电阻率系数(RCGF),电阻率和应变系数的影响。在先前的工作中,作者建议使用薄的多晶硅应变仪,该应变仪通过无机玻璃粉粘合剂粘合到金属结构上。但是,这种玻璃粉粘结工艺是在高温下进行的,这可能会导致多晶硅应变片的RCGF,电阻率和应变系数改变。为了研究玻璃粉粘结工艺的效果,比较并评估了在常规Al退火条件下进行热处理前后的多晶硅应变片的RCGF,电阻率和应变系数,并对其进行了评估。结果,在未经热处理的多晶硅应变仪中观察到较大的电阻率和应变系数偏差。尽管存在这些较大的偏差,但仍观察到电阻率与应变系数之间存在线性关系。在通过常规的Al退火条件和玻璃粉粘结条件对多晶硅应变仪进行热处理之后,电阻率和应变系数的值的偏差变得比未热处理的应变仪中更为均匀。在铝退火条件和玻璃料粘结条件下进行热处理的多晶硅应变片的RCGF与未经热处理的应变片的RCGF一致。

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  • 来源
    《Micro & Nano Letters, IET》 |2012年第9期|p.932-935|共4页
  • 作者

    Kim Y.; Kwon S.;

  • 作者单位

    Agency for Defense Development, 462 Jochiwon-gil, Yuseong-gu, Daejeon 305-152, Republic of Korea;

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  • 正文语种 eng
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