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Precise Thermal Expansion Measurements of Single Crystal Silicon with an Interferometric Dilatometer

机译:用干涉式膨胀计精确测量单晶硅的热膨胀

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摘要

Silicon is one of the most important reference materials for various thermophysical properties, such as thermal expansivity, specific heat capacity, thermal diffusivity thermal conductivity, and emissivity. Silicon can be manufactured as a large size high-purity dislocation-free single crystal which introduces stability. uniformity and universality with its physical properties. We have been developing an interferometric dilatometer operated at room temperature. The dilatometer comprises a double path intefferometer that utilizes an optical heterodyne technique and a compact vacuum thermal bath. controlled by a thermoelectric transducer, which enables both accurate and efficient measurements. In this paper, the linear thermal expansion coefficient (LTEC) of two silicon single-crystals oriented in the [110] and [100] directions over the temperature range between 0 and 50℃ was measured. The results for the thermal expansion coefficient of these two directions coincide with each other to within 0.4 × 10~(-8) K~(-1). The present data also show very good agreement with the CODATA recommended data to within 0.2 × 10~(-8) K~(-1) over the whole measured temperature range.
机译:硅是各种热物理性质(例如热膨胀系数,比热容,热扩散系数,导热系数和发射系数)最重要的参考材料之一。硅可以制造为大尺寸,高纯度,无位错的单晶,从而带来稳定性。物理特性的统一性和普遍性。我们一直在开发在室温下操作的干涉式膨胀仪。膨胀计包括利用光学外差技术和紧凑的真空热浴的双路径干涉仪。由热电换能器控制,可以进行准确而有效的测量。在本文中,测量了在0到50℃之间的温度范围内沿[110]和[100]方向取向的两个硅单晶的线性热膨胀系数(LTEC)。这两个方向的热膨胀系数的结果彼此吻合在0.4×10〜(-8)K〜(-1)之内。在整个测量温度范围内,本数据还显示与CODATA推荐数据非常吻合,在0.2×10〜(-8)K〜(-1)之内。

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