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Oxidation Behavior and Mechanisms of TiAlN/VN Coatings

机译:TiAlN / VN涂层的氧化行为及其机理

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摘要

Hard wear-resistant coatings require excellent oxidation resistance for high-speed machining operations. Moreover, the oxide formed is integral to the frictional behavior and therefore the success of the coating. The oxidation behavior of TiAlN/VN nanoscale multilayer coatings was investigated using high-resolution techniques and was compared with TiN and TiAlN coatings. Static oxidation of TiAlN/VN films was studied in the range 550 °C to 700 °C, and characterized by high-temperature in-situ X-ray diffraction (XRD) and scanning transmission electron microscopy/energy-dispersive X-ray/electron energy loss spectroscopy (STEM/EDX/EELS) of selected surface cross sections. The oxidation resistance of TiAlN/VN was found to be controlled by the VN layers, and consequently, oxidation was initiated at a lower temperature than TiN and TiAlN coatings. The onset of oxidation of the TiAlN/VN coating was found to be ≥550 °C with the VN being the first component to oxidize. At temperatures >600 °C, a duplex oxide structure was formed; the inner layer comprised a porous region of Ti-rich and V-rich nanocrystallites, while several phases were observed in the outer region, including V2O5, TiO2, and AlVO4. V2O5 was the dominant oxide at the outer layer at ≥638 °C. The outward diffusion of V depended on the species present; in the inner layer, V was present as V3+, V4+, whereas a significant V5+ was dominant in the outer layer of oxide at ≥638 °C. An Au marker study suggested roughly equal diffusivity of cations outward, and oxygen inward diffusion occurred during oxidation.
机译:硬质耐磨涂层需要出色的抗氧化性,才能进行高速加工。此外,形成的氧化物是摩擦性能不可或缺的部分,因此也是涂层成功的关键。使用高分辨率技术研究了TiAlN / VN纳米多层涂层的氧化行为,并将其与TiN和TiAlN涂层进行了比较。研究了TiAlN / VN薄膜在550°C至700°C范围内的静态氧化,并通过高温原位X射线衍射(XRD)和扫描透射电子显微镜/能量色散X射线/电子进行了表征。所选表面横截面的能量损失光谱(STEM / EDX / EELS)。发现TiAlN / VN的抗氧化性受VN层控制,因此,氧化的起始温度低于TiN和TiAlN涂层。发现TiAlN / VN涂层的氧化开始≥550°C,VN是第一个要氧化的成分。在> 600°C的温度下,形成了双相氧化物结构。内层包含一个富钛和富钒的纳米微晶的多孔区域,而在外层中观察到了多个相,包括V2 O5 ,TiO2 和AlVO4 。在≥638°C时,V2 O5 是外层的主要氧化物。 V的向外扩散取决于所存在的物质。在内层中,V以V3 + ,V4 + 的形式存在,而在≥638°C的氧化物外层中,显着的V5 + 占主导地位。一项金标记研究表明,阳离子向外扩散大致相等,并且在氧化过程中发生了氧气向内扩散。

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  • 来源
    《Metallurgical and Materials Transactions A》 |2007年第10期|2464-2478|共15页
  • 作者单位

    Department of Engineering Materials University of Sheffield Sheffield S1 3JD United Kingdom;

    Department of Engineering Materials University of Sheffield Sheffield S1 3JD United Kingdom;

    Department of Engineering Materials University of Sheffield Sheffield S1 3JD United Kingdom;

    Department of Engineering Materials University of Sheffield Sheffield S1 3JD United Kingdom;

    Materials Engineering Research Institute Sheffield Hallam University Sheffield S1 1WB United Kingdom;

    Materials Engineering Research Institute Sheffield Hallam University Sheffield S1 1WB United Kingdom;

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