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Copper and nickel removal from plating wastewater in the electrodialysis process using a channeled stack

机译:使用通道堆叠从电渗析工艺中从电渗析中取出铜和镍

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摘要

Electrodialysis (ED) is an advanced separation process used to treat industrial wastewater using potential differences. In this study, flow rates within the stack were increased by creating a flow channel to increase the limiting current density (LCD). Increasing the flow rate within the stack increases the diffusion flux, which leads to an increase in LCDs. Experiments show that the applied voltage of the flow-accelerated stack was improved by 12.2% compared to the stack without a flow channel, but the LCD decreased by 3.6%. The removal efficiency of both copper and nickel between the two stacks was greater than 95.6%, with no significant difference. However, the concentration rate of ions was superior in the stack without a flow channel. This may be attributed to the fact that the applied voltage increases when the channel is attached, resulting in differences in the separation rate and the resulting concentration polarization. In terms of the current efficiency, the channel-less stack was found to be 42.5% better than the channeled stack. It would be desirable to apply voltages below the LCDs as those exceeding LCDs at the same membrane flow rate would significantly reduce the economic feasibility.
机译:电渗析(ED)是一种先进的分离过程,用于使用潜在的差异治疗工业废水。在该研究中,通过产生流动通道来增加堆栈内的流速,以增加限制电流密度(LCD)。增加堆栈内的流速增加了扩散通量,这导致LCD的增加。实验表明,与没有流动通道的堆叠相比,流动加速堆叠的施加电压提高了12.2%,但LCD降低了3.6%。两堆叠之间的铜和镍的去除效率大于95.6%,没有显着差异。然而,在没有流动通道的情况下,离子的浓度优异。这可能归因于施加电压在连接通道时增加的事实,导致分离率和所得浓度极化的差异。就目前的效率而言,发现频道的堆栈比引导的堆叠更好地为42.5%。希望在LCD下方的电压施加电压,因为超过相同膜流量的LCD将显着降低经济可行性。

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