EFFECT OF ELECTROMAGNETIC FIELDS ON INTEGRATED MICROCIRCUITS

摘要

We consider the results of investigations on the effect of external electromagnetic fields on integrated microcircuits. We have determined the stability thresholds for microcircuits as a function of the electric field strength, the number of pulses to which they are exposed, and the relative orientation of the integrated microcircuit and the electromagnetic field. We have determined the reasons for local degradation of the metallization and we present data on the threshold values for degradation processes.