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Effect of Sn Content on the Microstructure, Mechanical and Electrical Properties of Ti_2AIC/Cu Joints Brazed with Cu-Sn-Ti Filler Alloy

机译:Sn含量对Cu-Sn-Ti钎料钎焊Ti_2AIC / Cu接头组织和力学性能的影响

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摘要

In the present study, Cu-Sn-Ti filler alloy with different content of Sn was used to join Ti_2AlC ceramic and copper at 950 ℃ for 10 minutes. Effect of Sn content on the microstructure, mechanical property and electrical conductivity of the joints were investigated. The results indicate that the joint was comprised of five parts: copper substrate/ diffusion area in the copper substrate (Cu[Al, Sn] solid solutions)/ brazing layer (Cu[Al, Sn]+CuSn_3Ti_5)/ interaction area in the Ti_2AlC substrate (Ti_2AlC+ Cu[Al]+AlCu_2Ti+TiC)/ Ti_2AlC ceramic substrate. With the content of Sn element in the joint increasing, the filler alloy performed lower melting point and better fluidity during brazing. Thus partial filler alloy flowed out of the brazing seam, leading to the reduction of CuSn_3Ti_5 phases. Simultaneously, more Ti and Al diffused toward the Cu substrate, where a line of AlCu_2Ti phases was formed. The maximum shear strength 158.5 MPa was obtained by using Cu80Sn10Ti10 (at.%) filler alloy, at which the joint strength was 71% of that of the Ti_2AlC ceramic. The joint strength was deteriorated while the higher content of Sn was incorporated (>10 at.%), which was caused by the weak interfacial bonding between the substrates and the brazing layer. Besides, the electrical conductivity was decreased from 5.65x106 s/m to 4.99×10_6 s/m with increasing Sn content in the filler alloy.
机译:在本研究中,使用具有不同Sn含量的Cu-Sn-Ti填充合金在950℃下将Ti_2AlC陶瓷和铜连接10分钟。研究了锡含量对接头组织,力学性能和电导率的影响。结果表明,该接头由五个部分组成:铜基板/铜基板中的扩散区域(Cu [Al,Sn]固溶体)/钎焊层(Cu [Al,Sn] + CuSn_3Ti_5)/ Ti_2AlC中的相互作用区域衬底(Ti_2AlC + Cu [Al] + AlCu_2Ti + TiC)/ Ti_2AlC陶瓷衬底。随着接头中Sn元素含量的增加,钎料在钎焊过程中的熔点较低,流动性更好。因此,部分填充合金从钎焊缝中流出,导致CuSn_3Ti_5相的减少。同时,更多的Ti和Al向Cu衬底扩散,形成了AlCu_2Ti相线。使用Cu80Sn10Ti10(原子%)填充合金可获得最大抗剪强度158.5 MPa,在该合金中,其结合强度为Ti_2AlC陶瓷的结合强度的71%。加入较高含量(> 10 at。%)的Sn时,接合强度会下降,这是由于基材与钎焊层之间的界面键合弱所致。此外,随着填充合金中锡含量的增加,电导率从5.65×106 s / m降低到4.99×10_6 s / m。

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