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Active joining of Ti-6Al-4V with electroplated Cu thin film

机译:Ti-6Al-4V与电镀铜薄膜的主动接合

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Joining of Ti-6Al-4V with thin film copper fillers was developed using an active infrared processing technique. The process includes rapid infrared heating of the specimen to 1125℃, and holding at that temperature for 60 s in flowing argon without vacuum, then followed by rapid cooling. The copper thin film filler was electroplated to various thicknesses: 1,2,4 and 8 μm. Excellent wetting between copper and Ti-6 Al-4V was observed in all joints. High joint shear strengths were obtained for all joints. The highest joint strength, 616 +- 10 MPa, was obtained with 2 μm filler thickness. This joint strength is significantly higher than the shear strength of pure copper, 174 MPa, or Ti-6Al-4V, 542 MPa. When the filler material was only 1 μm, the joint zone was not completely filled. X-ray diffraction analysis on the as fractured joint surface revealed the presence of intermetallic compounds when joined with 4 and 8 μm copper fillers but it disappeared when joined with 1 and 2 μm copper fillers.
机译:使用主动红外处理技术开发了Ti-6Al-4V与薄膜铜填料的连接。该过程包括将样品快速红外加热到1125℃,并在该温度下在无真空的氩气中保持60 s,然后快速冷却。将铜薄膜填料电镀至各种厚度:1、2、4和8μm。在所有接头中均观察到铜与Ti-6 Al-4V之间的优异润湿性。所有接头均获得了较高的接头剪切强度。填料厚度为2μm时,可获得最高的接头强度616±10 MPa。该接合强度显着高于纯铜的剪切强度174 MPa或Ti-6Al-4V的剪切强度542 MPa。当填充材料仅为1μm时,接合区域没有被完全填充。在断裂的接合面上进行的X射线衍射分析显示,当与4和8μm的铜填料连接时,存在金属间化合物,但当与1和2μm的铜填料连接时,金属间化合物消失。

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