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GROWTH AND PROPERTIES OF CdSe THIN FILMS BY A NEW PROCESS OF ELECTROCHEMICAL SELENIZATION OF Cd METAL LAYERS

机译:化学镀镉金属层的新工艺对CdSe薄膜的生长和性能的影响

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摘要

Growth and properties of cadmium selenide semiconductor thin films pre- pared by a new electrochemical selenization process (ECS) are described. The as-formed CdSe thin films have large (~l um) crystallites in hexagonal modification. The differential selenization kinetics in the intra- and intergrain regions causes the formation of stoichiometric CdSe film to be highly depen- dent on time. CdSe composition is independent of selenization parameters. Two direct optical band gaps at 2.09 and l.44 eV, as opposed to a single gap at l.7 eV, are observed in CdSe film selenized at 0.6 and 0.4 mA/cm~2 current densities, respectively. A mechanism of selenization based on Cd ionization by oxygen reduction and reaction with cathodically released Se ions is pro- posed for the CdSe film formation.
机译:描述了通过新的电化学硒化工艺(ECS)制备的硒化镉半导体薄膜的生长和性能。刚形成的CdSe薄膜具有六角形的大(〜1 um)微晶。颗粒内和颗粒间区域的硒化动力学差异导致化学计量的CdSe膜的形成与时间高度相关。 CdSe的成分与硒化参数无关。在分别以0.6和0.4 mA / cm〜2电流密度硒化的CdSe膜中,观察到两个直接光学带隙分别为2.09和1.44 eV,而单个间隙为1.7 eV。对于CdSe膜的形成,提出了一种基于氧还原作用使Cd电离并与阴极释放的Se离子反应的硒化机理。

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