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Substrate effect on in-plane dielectric and microwave properties of Ba(Sn_(0.15)Ti_(0.85))O_3 thin films

机译:衬底对Ba(Sn_(0.15)Ti_(0.85))O_3薄膜的面内介电和微波特性的影响

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摘要

The microstructure and in-plane dielectric and microwave properties of Barium tin titanate Ba(Sn_(0.15)Ti_(0.85)O_3 (BTS) thin films grown on (100) LaAlO_3 and (100) MgO single-crystal substrates through sol-gel process were investigated. X-ray diffraction and field emission scanning electron microscopy were used to characterize crystal structure of phases and microstructure of the thin films, respectively. Microwave properties of the films were measured from 1 to 10 GHz by the interdigital capacitor configuration. The obvious differences in the dielectric and microwave properties are attributed to the stress in the films, which result from the lattice mismatch and difference in the thermal expansion coefficients between the film and substrates. This work clearly reveals the highly promising potential of BTS films for application in tunable microwave devices.
机译:钛酸钡锡钡(Sn_(0.15)Ti_(0.85)O_3(BTS)薄膜的微结构,面内介电和微波性能通过(100)LaAlO_3和(100)MgO单晶衬底通过溶胶-凝胶工艺生长用X射线衍射和场发射扫描电子显微镜分别表征了薄膜的相结构和微观结构,采用叉指电容器结构在1 GHz至10 GHz范围内测量了薄膜的微波性能。介电和微波特性的差异归因于薄膜中的应力,这是由于晶格失配和薄膜与基板之间的热膨胀系数不同而引起的,这项工作清楚地揭示了BTS薄膜在可调谐应用中具有巨大潜力的潜力。微波设备。

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