首页> 外文期刊>Materials Research Bulletin >Growth Of Colorless Transparent Gan Single Crystals On Prismatic Gan Seeds Using A Ga Melt And Na Vapor
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Growth Of Colorless Transparent Gan Single Crystals On Prismatic Gan Seeds Using A Ga Melt And Na Vapor

机译:利用Ga熔体和Na蒸气在棱柱状Gan种子上生长无色透明Gan单晶

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摘要

Growth of GaN on seeds of GaN prismatic single crystals was carried out at 900 ℃ and N_2 pressure (P_N_2) of 0.8-7.0 MPa for 72 h by the Na flux method using premixed Na-Ga melts or Ga melt and Na vapor. Black GaN crystals, having some pits and striations on the facets, grew on the seeds when the premixed Na-Ga melts were used. A full-width at half maximum (FWHM) of the X-ray rocking curve measured for the (1010) (m plane) of the grown crystals was over 360 arcsec. Colorless and transparent GaN crystals with smooth facets were grown on the m plane of the seed crystals by using a Ga melt and Na vapor. The FWHM measured for the m plane of the colorless crystals was 112-204 arcsec. Cathodoluminescence (CL) spectra from the m plane of the crystals were measured at room temperature. Besides a near-band-edge (NBE) emission at 361-363 nm, the specimens grown with Ga melt and Na vapor at higher P_N_2 had a broad deep emission peak at 617 nm, while the specimens grown at lower P_N_2 had a shallow-level emission peak at 380 nm and a broad deep emission peak at 550 nm.
机译:使用预混合的Na-Ga熔体或Ga熔体和Na蒸气,通过Na助熔法在900℃和0.8-7.0 MPa的N_2压力(P_N_2)下于GaN棱柱形单晶晶种上生长GaN 72小时。当使用预混合的Na-Ga熔体时,黑色GaN晶体在晶面上生长,这些GaN的晶面上有一些凹坑和条纹。为生长的晶体的(1010)(m平面)测量的X射线摇摆曲线的半峰全宽(FWHM)超过360 arcsec。通过使用Ga熔体和Na蒸气,在晶种的m平面上生长出具有光滑小面的无色透明GaN晶体。对无色晶体的m平面测得的FWHM为112-204弧秒。在室温下测量晶体m平面的阴极发光(CL)光谱。除了在361-363 nm处的近带边缘(NBE)发射外,在较高的P_N_2下生长有Ga熔体和Na蒸气的样品在617 nm处具有较宽的深发射峰,而在较低P_N_2的条件下生长的样品较浅。在380 nm处有能级发射峰,在550 nm处有较宽的深发射峰。

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