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机译:温度和界面缓冲层对酞菁铜(II)纳米结构的影响:富勒烯本体异质结
Pohang Accelerator Laboratory, POSTECH, Pohang 790-784, Republic of Korea;
Department of Materials Science and Engineering and OLED Center, Seoul National University, Seoul 151-744, Republic of Korea;
Department of Materials Science and Engineering and OLED Center, Seoul National University, Seoul 151-744, Republic of Korea;
Department of Organic Material Science and Engineering, College of Engineering, Pusan National University, Busan 609-735, Republic of Korea;
A. Electronic materials; A. Interfaces; A. Nanostructure; A. Organic compounds; C. X-ray diffraction properties;
机译:界面层对电荷提取技术研究的聚合物/富勒烯批量结合装置开路电压的影响
机译:缓冲改性的富勒烯/铜酞菁异质结作为互连体的串联有机发光二极管的场和厚度相关性能
机译:铜酞菁和无金属酞菁本体异质结,用于温度传感
机译:用电子传输层(ETL)模拟铜酞菁/富勒烯异质结光伏电池
机译:半透明氧化锌:低温制备的铝/铜(I)氧化物薄膜异质结:结处本征ZnO缓冲层的作用
机译:聚合物-富勒烯本体异质结中界面结构的13C {2H}旋转回波双共振NMR表征
机译:加工批量 - 异质结函数时探测结晶效应:比较富勒烯和非氟联受体
机译:阳极界面层删除的后果。 p3HT中的HCl处理的ITO:基于pCBm的体 - 异质结有机光伏器件