A novel acrylic prepolymer/methacrylate modified nano-SiO_2 composite used for negative photoresist

摘要

A novel nanocomposite consisting of methacrylate modified nano-SiO_2 (SiO_2MA) and acrylic prepolymer (G-ACP) was found a potential candidate as a negative photoresist. The SiO_2MA was synthesized from glycidyl methacrylate (GMA), 3-aminpropyltriethoxysilane (KH550) and a pre-synthesized nano-SiO_2 through the sol-gel process. G-ACP was synthesized through radical polymerization of five monomers, followed by grafting with carboxyl and methacrylate group. The molecular structures of monomers and polymers were characterized by FT-IR and ~1H NMR spectroscopy. Finally, SiO_2MA was added into G-ACP in different contents and treated with a standard thermal and UV-exposure process to obtain a series of cured organic-inorganic nanocomposite photoresists. The formed nanocomposite photoresists exhibited improved photosensitivity and had a low D_n~(0.5) of 26.8 mJcm~(-2) with 13.7 wt% SiO_2MA. Moreover, the thermal and mechanical properties also showed great enhancement while all of the photoresists had a nice line pattern of less than 25 μm.