Atomic force microscopy study of Mo (110) surface topology after high temperature homoepitaxy

摘要

In this paper we report experimental results on investigation of Mo (110) single crystals surface topology carried out using AFM technique after high-temperature homoepitaxy within the frame of deposition rates 1-40 ML/s and in the interval of substrate temperatures 1900 ℃-2300 ℃. The systems of atomically flat steps on the surface of single crystal samples were observed. Typical height of the steps was in the range 1 -4 of (110) parallel lattice plane spacing, with width being about 50-70 nm. High temperature homoepitaxy of Mo leads to formation of micro-crystals with dimensions up to 150μ in width and few micrometres in height. Huge monatomic steps up to 5-10 μ in width were observed on flat (110) Mo micro-crystal planes slightly declined to the substrate surface. The root-mean-square (RMS) roughness of the micro-crystal surfaces achieves the values of 0.2 nm which is determined by the presence of monoatomic steps. The residual pattern of spiral growth was also observed on the top of (110) micro-crystal surfaces.