Polycrystalline Sr_2FeMoO_6 thin films on Si substrate by pulsed laser deposition for magnetoresistive applications

摘要

Polycrystalline Sr_2FeMoCO_6 (SFMO) thin films were deposited at different substrate temperatures (500-800 C) on STO buffered Si (100) substrates by pulsed laser deposition (PLD). Structural analysis shows the single phase formation of polycrystalline SFMO thin films. A large (～ 12％) high field magnetoresistance (HFMR) was observed at 5 K in polycrystalline films deposited at 800 C First time, we studied the MR effect in polycrystalline SFMO thin films grown on Si substrate, which make them very promising for magnetoresistive and spintronic applications and possibly open the future prospect for their possible integration in microelectronic industries.