Plasmonic properties of titanium nitride thin films prepared by ion beam assisted deposition

摘要

Titanium nitride (TiNx) is regarded as a kind of promising plasmonic material for its high performances. We studied the influence of nitrogen partial pressure p(n) and deposition temperature T-d on the structural and plasmonic properties of the TiNx thin films prepared by ion beam assisted deposition (IBAD). The results show that IBAD is an effective method to tailor the plasmonic properties of TiNx films in visible and near-IR region. The plasmonic properties of the films have significant T-d and p(n) dependence. Higher p(n) and lower T-d can reduce the plasma frequency and the plasmon resonance. Higher p(n) and higher T-d can reduce the optical loss of the samples. The modification of the plasmonic properties is related to the variation of nitrogen content. (C) 2016 Elsevier B.V. All rights reserved.