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Characterization of the reaction process in diffusion-soldered Cu/In―48 at.% Sn/Cu joints

机译:扩散焊接Cu / In―48 at。%Sn / Cu接头中反应过程的表征

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摘要

This work describes a Pb-free solder alternative for the interconnection technology and its implementation in a diffusion soldering technique: In―48 at.% Sn solder (eutectic alloy), with a melting point of 120 ℃. The system proposed has the advantages of both traditional soldering and diffusion bonding, i.e., good joint filling, high service temperature, and good mechanical properties. The diffusion reaction processes in Cu/In―48 at.% Sn/Cu joints were investigated between 180 and 400 ℃. Electron microprobe analysis revealed the presence of one or two intermetallic layers in the interconnection zone: a layer of the η phase below 200 ℃, and layers of the η and ζ phases above 200 ℃. The η and ζ phases form through a solid―liquid and a solid―solid diffusion reaction, respectively. Below 200 ℃ the η phase exhibits two different morphologies: large coarse grains at the η/(originally liquid)In―48 at.% Sn interface and a fine-grained region at the CU/η interface. The thickness of the ζ layer shows a constant growth rate (linear growth) at constant temperature. The temperature dependence of the growth rate constant of the ζ layer is described by an Arrhenius relationship with an activation energy equal to 121 kJ/mol and a pre-exponential factor of about 57 m/s.
机译:这项工作描述了一种用于互连技术的无铅焊料替代品,以及它在扩散焊接技术中的实现方式:熔点为120℃的In―48 at。%Sn焊料(低共熔合金)。提出的系统具有传统焊接和扩散结合的优点,即,良好的接头填充,较高的使用温度和良好的机械性能。研究了在180至400℃之间Cu / In-48 at。%Sn / Cu接头中的扩散反应过程。电子探针分析表明,在互连区内存在一层或两层金属间层:低于200℃的η相层和高于200℃的η相和ζ相层。 η相和ζ相分别通过固液扩散和固液扩散反应形成。在200℃以下,η相表现出两种不同的形态:η/(最初为液态)In-48 at。%Sn界面处有大的粗晶粒,而CU /η界面处有细晶粒的区域。 ζ层的厚度在恒定温度下显示出恒定的生长速率(线性生长)。 ζ层的生长速率常数的温度依赖性由Arrhenius关系描述,其活化能等于121 kJ / mol,预指数因子约为57 m / s。

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