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Oxidation of plasma surface modified zirconium alloy in pressurized high temperature water

机译:等离子表面改性锆合金在加压高温水中的氧化

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Oxidation of a zirconium-alloy, zircaloy-2 in the untreated (non-surface treated) condition and after ion implantation with nitrogen, carbon, and oxygen has been examined after exposure for 168 h to an environment of pressurized water at 25 MPa at temperatures of 300 and 500 deg C. At this pressure, water is in subcritical state at 300 deg C and supercritical state at 500 deg C. Cross-sectional scanning electron microscopy showed that oxidation occurred in the form of mainly an oxygen diffusion layer for the 300 deg C exposure, but for the 500 deg C exposure a uniform stoichiometric oxide layer and a sub-surface oxide diffusion layer were observed. For the 300 deg C exposure, carbon and nitrogen ion implantation resulted in a thinner oxygen affected layer compared to the untreated alloy. The oxygen ion implanted samples showed a thicker oxygen affected layer, but this included the thickness contributions from both thermal oxidation and prior oxygen ion implantation. After exposure at 500 deg C, the carbon and nitrogen ion implanted samples exhibited a thicker, and the oxygen ion implanted samples a thinner oxygen affected layer compared to the untreated alloy. A separate experiment involving exposure to supercritical water at 400 deg C for 168 h showed lower levels of oxidation in zircaloy-2 samples that were sputter coated with an yttrium film and subsequently bombarded with xenon ions prior to exposure.
机译:在温度为25 MPa的加压水环境中暴露168小时后,在未处理(未经表面处理)条件下以及氮,碳和氧离子注入后,对锆合金Zircaloy-2的氧化进行了检查。 300和500摄氏度。在此压力下,水在300摄氏度处于亚临界状态,在500摄氏度处于超临界状态。横截面扫描电子显微镜显示,氧化对于300氧化主要以氧扩散层的形式发生℃暴露,但是对于500℃暴露,观察到均匀的化学计量氧化物层和次表面氧化物扩散层。对于300℃的暴露,与未处理的合金相比,碳和氮离子注入产生的氧影响层更薄。注入氧离子的样品显示出较厚的氧影响层,但这包括来自热氧化和先前氧离子注入的厚度贡献。与未经处理的合金相比,在500℃下暴露后,注入碳和氮离子的样品呈现出较厚的特性,而注入氧离子的样品具有较薄的氧影响层。另一个涉及在400℃下暴露于超临界水中168小时的实验表明,Zircaloy-2样品中的氧化水平较低,这些样品用钇膜溅射涂层,然后在暴露前用氙离子轰击。

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