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Oxidation of plasma surface modified zirconium alloy in pressurized high temperature water

机译:等离子表面改性锆合金在加压高温水中的氧化

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摘要

Oxidation of a zirconium-alloy, zircaloy-2 in the untreated (non-surface treated) condition and after ion implantation with nitrogen, carbon, and oxygen has been examined after exposure for 168 h to an environment of pressurized water at 25 MPa at temperatures of 300 and 500 ℃. At this pressure, water is in subcritical state at 300 ℃ and supercritical state at 500 ℃. Cross-sectional scanning electron microscopy showed that oxidation occurred in the form of mainly an oxygen diffusion layer for the 300 ℃ exposure, but for the 500 ℃ exposure a uniform stoichiometric oxide layer and a sub-surface oxide diffusion layer were observed. For the 300 ℃ exposure, carbon and nitrogen ion implantation resulted in a thinner oxygen affected layer compared to the untreated alloy. The oxygen ion implanted samples showed a thicker oxygen affected layer, but this included the thickness contributions from both thermal oxidation and prior oxygen ion implantation. After exposure at 500 ℃, the carbon and nitrogen ion implanted samples exhibited a thicker, and the oxygen ion implanted samples a thinner oxygen affected layer compared to the untreated alloy. A separate experiment involving exposure to supercritical water at 400 ℃ for 168 h showed lower levels of oxidation in zircaloy-2 samples that were sputter coated with an yttrium film and subsequently bombarded with xenon ions prior to exposure.
机译:在温度为25 MPa的加压水环境中暴露168小时后,在未经处理(未经表面处理)的条件下以及用氮,碳和氧进行离子注入后,对锆合金zircaloy-2的氧化进行了检查。 300和500℃。在此压力下,水在300℃处于亚临界状态,在500℃处于超临界状态。截面扫描电子显微镜显示,在300℃暴露下,氧化主要以氧扩散层的形式发生,但在500℃暴露下,观察到均匀的化学计量氧化物层和次表面氧化物扩散层。与未经处理的合金相比,对于300℃的暴露,碳和氮离子注入产生的氧影响层更薄。注入氧离子的样品显示出较厚的氧影响层,但这包括来自热氧化和先前氧离子注入的厚度贡献。与未处理的合金相比,在500℃下暴露后,碳和氮离子注入的样品呈现出较厚的特性,而氧离子注入的样品则具有较薄的氧影响层。另一项涉及在400℃下超临界水中暴露168 h的实验显示,Zircaloy-2样品的氧化水平较低,这些样品用钇膜溅射涂层,然后在暴露前用氙离子轰击。

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