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Near-Interface Composition in Pressure Sensitive Adhesives at the Adhesive–Adherent Interface

机译:粘合剂粘附界面压敏粘合剂的近界面组成

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摘要

The adhesive-adherent interface of a model system for pressure sensitive adhesives (PSAs) is probed with neutron reflectivity to reveal its inner composition. The statistical copolymer poly(ethylhexyl-stat-d-methylmethacrylate) P(EHA-stat-dMMA), consisting of 80wt% ethylhexylacrylate (EHA) and 20wt% deuterated methylmethacrylate (dMMA), is used as model PSA. Its interface with silicon is investigated. The surface cleaning treatments applied to silicon strongly affect the inner near interface structure of the solution cast P(EHA-stat-dMMA). Two opposite behaviors are observed. On acid cleaned silicon the soft and sticky majority component EHA enriches at the interface to the substrate. In contrast, the glassy minority component dMMA forms an enrichment layer at the interface to the basic cleaned silicon surface.
机译:用中子反射率探测压敏粘合剂(PSAS)模型系统的粘附贴膜界面,以显示其内部组合物。由80wt%乙基己基丙烯酸酯(EHA)和20wt%氘代甲基丙烯酸甲酯(DMMA)组成的统计共聚物聚(乙基己基-TAT-D-甲基丙烯酸酯)P(EHA-STAT-DMMA)用作模型PSA。研究了与硅的界面。施加到硅的表面清洁处理强烈影响溶液铸造P(EHA-Stat-DMMA)的内部接近界面结构。观察到两个相反的行为。在酸洗硅上,柔软和粘性的大多数组分EHA在界面上富集到基材。相反,玻璃少数群体组分DMMA在界面处形成基本清洁硅表面的富集层。

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