首页> 外文期刊>The Korean journal of chemical engineering >Lithographically patterned micro-anostructures via colloidal lithography
【24h】

Lithographically patterned micro-anostructures via colloidal lithography

机译:通过胶体光刻光刻图案化的微/纳米结构

获取原文
获取原文并翻译 | 示例
获取外文期刊封面目录资料

摘要

Colloidal lithography is an effective and facile strategy for highly ordered nanostructure arrays that is a simple, inexpensive, and high-throughput process with a broad choice of materials in manufacturing various lithographically patterned nanostructures on substrates. To develop such nanostructured systems, various nanofabrication techniques are employed on two-dimensional (2D) colloidal masks for evaporation, electrochemical deposition, etching, dewetting and mask replication. Ordered nanostructures associated with feature shapes and sizes can be diversified through a choice of methodology and a control of experimental conditions. This review presents an overview of colloidal crystals as a mask and nanostructure arrays (nanopillars, nanoring, nanopores) fabricated by colloidal lithography as well as introducing practical applications using ordered nanostructures.
机译:胶体光刻是用于高度有序的纳米结构阵列的一种有效且简便的策略,该工艺是一种简单,廉价且高通量的工艺,具有多种材料供选择,以在基板上制造各种光刻图案化的纳米结构。为了开发这种纳米结构系统,在二维(2D)胶体掩模上采用了各种纳米加工技术,以进行蒸发,电化学沉积,蚀刻,去湿和掩模复制。与特征形状和大小相关的有序纳米结构可以通过选择方法和控制实验条件来实现多样化。这篇综述介绍了胶体晶体作为掩模和通过胶体光刻制造的纳米结构阵列(纳米柱,纳米环,纳米孔)的概述,并介绍了使用有序纳米结构的实际应用。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号