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The Application of Motif Characterizing Method in the Surface Topography Evaluation of MEMS Device

机译:母题表征方法在MEMS器件表面形貌评价中的应用

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摘要

The surface topography characterization of MEMS device is very important to bonding technology of MEMS device. Motif characterizing method is a characterizing method of surface topography by graph. Aiming at the diversity and regionality of surface topography of MEMS device, in this study we have sampled the surface of MEMS device by 3-dimentinal grids using the surface profiler developed by us and characterizes the surface topography of MEMS device by the extended Motif characterizing method. The surface of MEMS device is divided into several Motif regions; the surface topography of every divided region can be evaluated respectively; the details of every region can be zoomed and these regions as a whole or every region can be revolved and projected; one of these regions can be as the reference of other regions. So the height, gradient and other characteristics of others regions of the whole MEMS device surface can be analyzed relative to the reference region; the whole and local surface topography of whole MEMS device can be analyzed.
机译:MEMS器件的表面形貌表征对于MEMS器件的键合技术非常重要。图案表征方法是通过图形表征表面形貌的方法。针对MEMS器件表面形貌的多样性和区域性,本研究中使用我们开发的表面轮廓仪通过3维网格对MEMS器件表面进行了采样,并通过扩展的Motif表征方法表征了MEMS器件的表面形貌。 。 MEMS器件的表面分为多个Motif区域。可以分别评估每个分割区域的表面形貌;可以缩放每个区域的细节,并且可以对这些区域作为一个整体或每个区域进行旋转和投影;这些区域之一可以作为其他区域的参考。因此,可以相对于参考区域来分析整个MEMS器件表面的其他区域的高度,梯度和其他特征。可以分析整个MEMS器件的整体和局部表面形貌。

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